In this study, to fabricate diamond concave microlenses in a simple manner, an approach that combines a spin coating process with subsequent dry etching was demonstrated. First, photolithography was used to produce cylindrical holes in the photoresist layer on the diamond surface. Then, another photoresist was spin coated to fill the holes, and the concave structures with meniscus shapes were then obtained because of centrifugal force and interfacial tension. Finally, diamond concave microlenses were formed by transferring photoresist concave structures onto a diamond substrate using a dry etching technique. The fabricated diamond microlens exhibits a low surface roughness with nanometers as well as high-quality imaging and focusing performances, which is expected to have a wider range of potential applications under harsh and special conditions.