We demonstrate a concept and fabrication of lithography-free layered metal-SiO2 thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500-1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized.
Keywords: Metamateraial; optical absorber; thin-film optics.