Multi-functional quinary Cr-Al-Ti-Si-N thin films were deposited onto WC-Co substrates using a cathodic arc evaporation system. In this study, the influence of silicon contents on the microstructure, mechanical, tribological, and oxidation properties of Cr-Al-Ti-Si-N thin films were systematically investigated and correlated for application of cutting tools. Based on results from various analyses, the Cr-Al-Ti-Si-N films showed excellent properties including mechanical, tribological, oxidation and adhesion values compared with those of the Cr-Al-Ti-N film. The Cr-Al-Ti-Si-N films with a Si content of around 4.21 at.% exhibited the highest hardness of 45 GPa, very low friction coefficient of 0.38 at room temperature against an Inconel alloy ball and superior adhesion property (105 N). The Cr-Al-Ti-Si-N films also showed excellent oxidation resistance after annealing in the ambient air at 1000 °C. Therefore, the Cr-Al-Ti-Si(4.21 at.%)-N films could be help to improve the performance of machining and cutting tools with application of the films.