Atomic Layer Deposition of GdCoO3 and Gd0.9Ca0.1CoO3

Marion Duparc; Henrik Hovde Sønsteby; Ola Nilsen; Anja Olafsen Sjåstad; Helmer Fjellvåg

doi:10.3390/ma13010024

Atomic Layer Deposition of GdCoO₃ and Gd_0.9Ca_0.1CoO₃

Materials (Basel). 2019 Dec 19;13(1):24. doi: 10.3390/ma13010024.

Authors

Marion Duparc¹, Henrik Hovde Sønsteby¹, Ola Nilsen¹, Anja Olafsen Sjåstad¹, Helmer Fjellvåg¹

Affiliation

¹ Centre for Materials Science and Nanotechnology, Department of Chemistry, University of Oslo, 0315 Oslo, Norway.

Abstract

Thin films of the catalytically interesting ternary and quaternary perovskites GdCoO₃ and Gd_0.9Ca_0.1CoO₃ are fabricated by atomic layer deposition using metal β-diketonates and ozone as precursors. The resulting thin films are amorphous as deposited and become single-oriented crystalline on LaAlO₃(100) and YAlO₃(100/010) after post-annealing at 650 °C in air. The crystal orientations of the films are tunable by choice and the orientation of the substrate, mitigated through the interface via solid face epitaxy upon annealing. The films exhibit no sign of Co²⁺. Additionally, high-aspect-ratio Si(100) substrates were used to document the suitability of the developed process for the preparation of coatings on more complex, high-surface-area structures. We believe that coatings of GdCoO₃ and Gd_1-xCa_xCoO₃ may find applications within oxidation catalysis.

Keywords: atomic layer deposition; gadolinium cobaltites; high-aspect-ratio substrate; ozone; preferential crystal growth orientation; β-diketonates.

Grants and funding

247753/Norges Forskningsråd