The UV/persulfate (PS) process is a promising water treatment technology, and it can not only effectively degrade contaminants of emerging concern, but also control formation of disinfection byproducts (DBPs). In this study, we investigated the potential and mechanisms of chloropicrin (i.e. trichloronitromethane, TCNM) formation during chlorination that followed UV/PS pretreatment in the presence of low concentrations of nitrite. We found that when nitrite was present in the UV/PS system, unexpected high concentrations of TCNM were formed. The formation potential of TCNM was impacted by operational conditions and water matrix components: (1) high pH enhanced TCNM formation; (2) high UV fluence inhibited TCNM formation; and (3) organic compounds containing phenolic groups enhanced TCNM formation. We discovered that electrophilic substitutions by reactive nitrogen species were favored for phenolic groups, and thus more nitrite-N was transformed to organic nitrogen. We also found that more TCNM was generated from natural organic matter than algal organic matter during chlorination following pretreatment using UV/PS. Accordingly, more attention needs to be paid to TCNM formation, if nitrite is present and the water is pretreated using UV/PS (when applied at upstream of chlorination). For example, we found that if monochloramine was used as a disinfectant downstream of the UV/PS process, the formation of TCNM was reduced.
Keywords: Chloropicrin; Nitrite; Phenolic group; Reactive nitrogen species; UV/Persulfate.
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