A Molecular Approach for Mitigation of Aluminum Pitting based on Films of Zinc(II) and Gallium(III) Metallosurfactants

A D K Isuri Weeraratne; Chathuranga C Hewa-Rahinduwage; Sunalee Gonawala; Long Luo; Cláudio N Verani

doi:10.1002/chem.201903408

A Molecular Approach for Mitigation of Aluminum Pitting based on Films of Zinc(II) and Gallium(III) Metallosurfactants

Chemistry. 2019 Nov 7;25(62):14048-14053. doi: 10.1002/chem.201903408. Epub 2019 Oct 16.

Authors

A D K Isuri Weeraratne¹, Chathuranga C Hewa-Rahinduwage¹, Sunalee Gonawala¹, Long Luo¹, Cláudio N Verani¹

Affiliation

¹ Department of Chemistry, Wayne State University, 5101 Cass Ave, Detroit, MI, 48202, USA.

PMID: 31565813
DOI: 10.1002/chem.201903408

Abstract

The use of metallosurfactants to prevent pitting corrosion of aluminum surfaces is discussed based on the behavior of the metallosurfactants [Zn^II (L^N2O2 )H₂ O] (1) and [Ga^III (L^N2O3 )] (2). These species were deposited as multilayer Langmuir-Blodgett films and characterized by IR reflection absorption spectroscopy and UV/Vis spectroscopy. Scanning electron microscopy images, potentiodynamic polarization experiments, and electrochemical impedance spectroscopy were used to assess corrosion mitigation. Both metallosurfactants demonstrate superior anticorrosion activity due to the presence of redox-inactive 3d¹⁰ metal ions that enhance the structural resistance of the ordered molecular films and limit chloride mobility and electron transfer.

Keywords: aluminum corrosion; aluminum pitting; gallium complexes; metallosurfactants; zinc complexes.

Abstract

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