A unique freestanding nickel (Ni) metallic mesh-based electromagnetic interference shielding film has been fabricated though the direct-writing technique and a subsequent selective metal electrodeposited process. The structured freestanding Ni mesh film demonstrates a series of advantages, including ultrathin thickness (2.5-6.0 μm) and ultralight weight (0.23 mg cm-2), extraordinary optoelectronic performance (sheet resistance about 0.24-0.7 Ω sq-1 with transparency of 92%-93%), high figure of merit (18000) and outstanding flexibility as it can withstand folding, rolling and crumpling into various shapes while keeping the conductivity constant. Furthermore, by using this high-performance Ni mesh, an ultrathin, lightweight, freestanding and transparent electromagnetic interference shielding (EMI) film with extraordinary optoelectronic properties (shielding effectiveness about 40 dB with transparency of 92%) is demonstrated in X-band, with no performance attenuation observed even in bending state. This freestanding metallic mesh-structured electrode can be further explored or applied in various potential applications, such as conformal microwave antennas, transparent EMI windows, and wearable electronics.