A Force-Engineered Lint Roller for Superclean Graphene

Luzhao Sun; Li Lin; Zihao Wang; Dingran Rui; Zhiwei Yu; Jincan Zhang; Yanglizhi Li; Xiaoting Liu; Kaicheng Jia; Kexin Wang; Liming Zheng; Bing Deng; Tianbao Ma; Ning Kang; Hongqi Xu; Konstantin S Novoselov; Hailin Peng; Zhongfan Liu

doi:10.1002/adma.201902978

A Force-Engineered Lint Roller for Superclean Graphene

Adv Mater. 2019 Oct;31(43):e1902978. doi: 10.1002/adma.201902978. Epub 2019 Sep 10.

Authors

Luzhao Sun^{1

2}, Li Lin^{1

3}, Zihao Wang³, Dingran Rui⁴, Zhiwei Yu⁵, Jincan Zhang^{1

2}, Yanglizhi Li^{1

2}, Xiaoting Liu^{1

2}, Kaicheng Jia¹, Kexin Wang¹, Liming Zheng¹, Bing Deng¹, Tianbao Ma⁵, Ning Kang⁴, Hongqi Xu⁴, Konstantin S Novoselov³, Hailin Peng^{1

6}, Zhongfan Liu^{1

6}

Affiliations

¹ Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.
² Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.
³ School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK.
⁴ Beijing Key Laboratory of Quantum Devices, Key Laboratory for the Physics and Chemistry of Nanodevices, and Department of Electronics, Peking University, Beijing, 100871, P. R. China.
⁵ State Key Laboratory of Tribology, Tsinghua University, Beijing, 100084, P. R. China.
⁶ Beijing Graphene Institute, Beijing, 100095, P. R. China.

PMID: 31502709
DOI: 10.1002/adma.201902978

Abstract

Contamination is a major concern in surface and interface technologies. Given that graphene is a 2D monolayer material with an extremely large surface area, surface contamination may seriously degrade its intrinsic properties and strongly hinder its applicability in surface and interfacial regions. However, large-scale and facile treatment methods for producing clean graphene films that preserve its excellent properties have not yet been achieved. Herein, an efficient postgrowth treatment method for selectively removing surface contamination to achieve a large-area superclean graphene surface is reported. The as-obtained superclean graphene, with surface cleanness exceeding 99%, can be transferred to dielectric substrates with significantly reduced polymer residues, yielding ultrahigh carrier mobility of 500 000 cm² V^-1 s^-1 and low contact resistance of 118 Ω µm. The successful removal of contamination is enabled by the strong adhesive force of the activated-carbon-based lint roller on graphene contaminants.

Keywords: clean surface; contaminants; graphene; ultrahigh mobility.

Abstract

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