Photo roller lithography systems can generate patterns continuously over large areas by employing flexible photomasks on rotating quartz cylinders. In comparison, plasmonic lithography systems can reach deep sub-wavelength resolution utilizing evanescent waves carrying high spatial frequency components. In this work, we demonstrate a plasmonic roller system by integrating a quartz mechanical roller with a specially designed photomask based on plasmonic waveguide lithography. Deep sub-wavelength uniform patterns with high aspect ratios were printed continuously over a moving substrate. The plasmonic roller system may find practical applications in the large-scale production of electronic and photonic devices in a cost-effective way.