Electron attachment to hexafluoropropylene oxide (HFPO)

M Zawadzki; A Chachereau; J Kočišek; C M Franck; J Fedor

doi:10.1063/1.5051724

Electron attachment to hexafluoropropylene oxide (HFPO)

J Chem Phys. 2018 Nov 28;149(20):204305. doi: 10.1063/1.5051724.

Authors

M Zawadzki¹, A Chachereau², J Kočišek¹, C M Franck², J Fedor¹

Affiliations

¹ J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejškova 3, 18223 Prague, Czech Republic.
² Power Systems and High Voltage Laboratories, ETH Zurich, Physikstr. 3, 8092 Zurich, Switzerland.

PMID: 30501269
DOI: 10.1063/1.5051724

Abstract

We probe the electron attachment in hexafluoropropylene oxide (HFPO), C₃F₆O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10^-4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20-100 mbar. In the latter method, the cross sections are unfolded from the electron attachment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.