A noninvasive, optical plasma monitoring method in plasma-enhanced atomic layer deposition (PEALD) process for nanoscale water vapor barrier film is presented. Any equipment malfunction, as well as a deviation in the condition of individual components can easily jeopardize the process result. Al₂O₃ deposition process was employed in this research as a test vehicle, and high-speed optical plasma monitoring was demonstrated. It is shown that optical plasma monitoring is useful for not only measuring plasma pulses in real time, but also for the detection of any variation in plasma condition which enables inferring plasma dynamics for advanced process control in nanoscale thin film deposition process.