Integrable Near-Infrared Photodetectors Based on Hybrid Erbium/Silicon Junctions

Sensors (Basel). 2018 Nov 3;18(11):3755. doi: 10.3390/s18113755.

Abstract

This paper presents the design, fabrication, and characterization of Schottky erbium/silicon photodetectors working at 1.55 µm. These erbium/silicon junctions are carefully characterized using both electric and optical measurements at room temperature. A Schottky barrier ΦB of ~673 meV is extrapolated; the photodetectors show external responsivity of 0.55 mA/W at room temperature under an applied reverse bias of 8 V. In addition, the device performance is discussed in terms of normalized noise and noise-equivalent power. The proposed devices will pave the way towards the development of Er-based photodetectors and light sources to be monolithically integrated in the same silicon substrate, and both operating at 1.55 µm.

Keywords: erbium; internal photoemission; near-infrared; photodetectors; silicon.