Surface and Interface Chemistry in Colloidal Quantum Dots for Solar Applications Studied by X-Ray Photoelectron Spectroscopy

Abstract

Control of the surface and interface chemistry of colloidal quantum dots (CQDs) is critical to achieving a product with good air stability and high performing optoelectronic devices. Through various surface passivation treatments, vast improvements have been made in fields such as CQD photovoltaics; however devices have not currently reached commercial standards. We show how X-ray photoelectron spectroscopy (XPS) can provide a better understanding of exactly how surface treatments act on CQD surfaces, and the effect of surface composition on air stability and device performance.. We illustrate this with PbS-based CQDs, using XPS to measure oxidation processes, and to quantify the composition of the topmost surface layer after different surface treatments. We also demonstrate the use of synchrotron radiation-excited depth-profiling XPS, a powerful technique for determining the surface composition, chemistry and structure of CQDs. This review describes our recent progress in characterization of CQD surfaces using SR-excited depth profiling XPS and other photoemission techniques.

Keywords: X-ray photoelectron spectroscopy; depth-profiling; nanocrystal; quantum dot; surface characterization.