Ru/B4C multilayer mirrors are used for hard X-ray monochromators with moderate spectral resolution and high integral flux. To overcome the problem of large compressive stress inherent in Ru/B4C multilayers, a reactive sputtering technique using a mixture working gas of argon and nitrogen with different partial pressures was tested, and the fabricated multilayers had a period of 3 nm. The intrinsic stress was essentially reduced after nitridation and relaxed to zero value at approximately 15% partial pressure of nitrogen in the working gas. Interface roughness was slightly increased which can be caused by the polycrystalline structure inside the nitridated samples. More importantly, the nitridated multilayers showed an enhanced reflectance (67% at 8.04 keV photon energy) as compared with the one fabricated with pure Ar (54%). The structure analysis with transmission electron microscopy and X-ray photoelectron spectroscopy demonstrated that nitrogen incorporated into a multilayer structure was mostly located in the B4C layers forming BN compounds, which suppressed the diffusion of boron, stabilized the interfaces and enhanced the reflectance.