Slit arrays based on noble metals have been widely proposed as planar transverse-magnetic (TM)-lenses, illuminated by a linearly polarized light with the polarization perpendicular to slits and implementing the focusing capability beyond the diffraction limit. However, due to intrinsic plasmonic losses, these TM-lenses cannot work efficiently in the ultraviolet wavelengths. In this Letter, taking advantage of the unique transmission through metallic slits not involving plasmonic losses, a metallic slit array with transverse-electric (TE)-polarized design is proposed, showing for the first time, to the best of our knowledge, the realization of sub-diffraction-limit focusing for ultraviolet light. Additionally, in contrast to the situations of TM-lenses, a wider slit leads to a greater phase delay and much larger slits can be arranged to construct the TE-lenses, which is quite beneficial for practical fabrication. Furthermore, deep-subwavelength focusing can be achieved by utilizing the immersing technology.