Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

Beilstein J Nanotechnol. 2017 Dec 5:8:2591. doi: 10.3762/bjnano.8.259. eCollection 2017.

Authors

Dédalo Sanz-Hernández¹, Amalio Fernández-Pacheco¹

Affiliation

¹ Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom.

Abstract

[This corrects the article DOI: 10.3762/bjnano.8.214.].

Keywords: 3D nanoprinting; BET model; Langmuir model; adsorption isotherm theory; continuum model; focused electron beam induced deposition.

Publication types

Published Erratum