Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition

Junsheng Liang; Pengfei Li; Dazhi Wang; Xu Fang; Jiahong Ding; Junxiong Wu; Chang Tang

doi:10.3390/ma9010061

Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition

Materials (Basel). 2016 Jan 19;9(1):61. doi: 10.3390/ma9010061.

Authors

Junsheng Liang¹, Pengfei Li², Dazhi Wang³, Xu Fang⁴, Jiahong Ding⁵, Junxiong Wu⁶, Chang Tang⁷

Affiliations

¹ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. jsliang@dlut.edu.cn.
² Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. lipengfeizuoyou@mail.dlut.edu.cn.
³ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. d.wang@dlut.edu.cn.
⁴ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. prancer@mail.dlut.edu.cn.
⁵ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. dingjiahong@mail.dlut.edu.cn.
⁶ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. wujunxiong@mail.dlut.edu.cn.
⁷ Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China. tangchang@mail.dlut.edu.cn.

Abstract

Dense and crack-free barium titanate (BaTiO₃, BTO) thin films with a thickness of less than 4 μm were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height and line-to-line pitch of the deposition on the micro-structure of BTO thin films were investigated. Results show that crack-free BTO thin films can be prepared with 4 mm jet height and 300 μm line-to-line pitch in this work. Dielectric constant of the prepared BTO thin film was recorded as high as 2940 at 1 kHz at room temperature. Meanwhile, low dissipation factor of the BTO thin film of about 8.6% at 1 kHz was also obtained. The layer-by-layer E-jet deposition technique developed in this work has been proved to be a cost-effective, flexible and easy to control approach for the preparation of high-quality solid thin film.

Keywords: BTO; Crack-free; E-jet deposition; Thin film.