Bandgap measurement of high refractive index materials by off-axis EELS

Ultramicroscopy. 2017 Nov:182:92-98. doi: 10.1016/j.ultramic.2017.06.019. Epub 2017 Jun 20.

Abstract

In the present work Cs aberration corrected and monochromated scanning transmission electron microscopy electron energy loss spectroscopy (STEM-EELS) has been used to explore experimental set-ups that allow bandgaps of high refractive index materials to be determined. Semi-convergence and -collection angles in the µrad range were combined with off-axis or dark field EELS to avoid relativistic losses and guided light modes in the low loss range to contribute to the acquired EEL spectra. Off-axis EELS further supressed the zero loss peak and the tail of the zero loss peak. The bandgap of several GaAs-based materials were successfully determined by simple regression analyses of the background subtracted EEL spectra. The presented set-up does not require that the acceleration voltage is set to below the Čerenkov limit and can be applied over the entire acceleration voltage range of modern TEMs and for a wide range of specimen thicknesses.

Keywords: Bandgap measurements; GaAs; Low-loss EELS; Relativistic losses.

Publication types

  • Research Support, Non-U.S. Gov't