Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors

Serge Zhuiykov; Mohammad Karbalaei Akbari; Zhenyin Hai; Chenyang Xue; Hongyan Xu; Lachlan Hyde

doi:10.1016/j.dib.2017.06.013

Data set for fabrication of conformal two-dimensional TiO₂ by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H₂O precursors

Data Brief. 2017 Jun 9:13:401-407. doi: 10.1016/j.dib.2017.06.013. eCollection 2017 Aug.

Authors

Serge Zhuiykov¹, Mohammad Karbalaei Akbari¹, Zhenyin Hai¹, Chenyang Xue², Hongyan Xu³, Lachlan Hyde⁴

Affiliations

¹ Ghent University Global Campus, Faculty of Bioscience Engineering, Incheon, South Korea.
² Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education, North University of China, 030051, PR China.
³ School of Materials Science and Engineering, North University of China, 030051, PR China.
⁴ Melbourne Centre for Nanofabrication, 151 Wellington Road, Clayton, VIC 3168, Australia.

Abstract

The data and complementary information presented hare are related to the research article of "http://dx.doi.org/10.1016/j.matdes.2017.02.016; Materials and Design 120 (2017) 99-108" [1]. The article provides data and information on the case of atomic layer deposition (ALD) of ultra-thin two-dimensional TiO₂ film. The chemical structure of precursors, and the fabrication process were illustrated. The data of spectral ellipsometric measurements and the methods of calculations were presented. Data of root mean square roughness and the average roughness of the ADL TiO₂ film are presented. The method of bandgap measurements and the bandgap calculation are also explained in the present data article.

Keywords: Atomic layer deposition; Atomic-layered TiO2; TDMAT precursor.