We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.
Keywords: meta-photoresist; subdiffraction limit; superlens effect; surface plasmon excitation; ultraviolet nanolithography.