Use of Supramolecular Assemblies as Lithographic Resists

Abstract

A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.

Keywords: heterometallic compounds; lithography; resist materials; supramolecular assembly.