In many optoelectronic applications, patterning is required for functional and/or aesthetic purposes. However, established photolithographic technique cannot be applied directly to the hybrid perovskites, which are considered as promising candidates for optoelectronic applications. In this work, a wettability-assisted photolithography (WAP) process, which employs photolithography and one-step solution process to deposit hybrid perovskite, was developed for fabricating patterned hybrid perovskite films. Uniform pinhole-free hybrid perovskite films with sharp-edged micropatterns of any shapes can be constructed through the WAP process. Semitransparent solar cells with an adjustable active layer average visible transmittance of a wide range from 20.0% to 100% and regular solar cells based on patterned CH3NH3PbI3 perovskite films were fabricated to demonstrate that the WAP process was compatible with the manufacturing process of optoelectronic devices. With the widely equipped photolithographic facilities in the modern semiconductor industry, we believe the WAP process have a great potential in the industrial production of functionally or aesthetically patterned hybrid perovskite devices.
Keywords: Patterning; perovskite solar cells; photolithography; semitransparent solar cells.