Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

Vyshnavi Narayanan; Els Bruneel; Ruben Hühne; Isabel Van Driessche

doi:10.3390/nano2030251

Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

Nanomaterials (Basel). 2012 Aug 9;2(3):251-267. doi: 10.3390/nano2030251.

Authors

Vyshnavi Narayanan¹, Els Bruneel², Ruben Hühne³, Isabel Van Driessche⁴

Affiliations

¹ Sol-Gel Centre for Research on Inorganic Powders and Thin Film Synthesis SCRiPTS, Department of Inorganic and Physical Chemistry, Ghent University, Krijgslaan 281-S3, Gent B-9000, Belgium. vyshnavi.narayanan@ugent.be.
² Sol-Gel Centre for Research on Inorganic Powders and Thin Film Synthesis SCRiPTS, Department of Inorganic and Physical Chemistry, Ghent University, Krijgslaan 281-S3, Gent B-9000, Belgium. els.bruneel@ugent.be.
³ IFW Dresden, Helmholtzstrasse 20, Dresden 01069, Germany. r.huehne@ifw-dresden.de.
⁴ Sol-Gel Centre for Research on Inorganic Powders and Thin Film Synthesis SCRiPTS, Department of Inorganic and Physical Chemistry, Ghent University, Krijgslaan 281-S3, Gent B-9000, Belgium. isabel.vandriessche@ugent.be.

Abstract

This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y₁Ba₂Cu₃O_y (YBCO) coated conductors.

Keywords: X-ray photoelectron spectroscopy; cleaning of Ni-5% W substrate; depth profile studies; thin films and coatings.