We report a theoretical and experimental study on a novel type of aluminum super absorber which exhibits a near perfect absorption based on the surface plasmon resonance in the visible and near-infrared spectrum. The absorber consists of Ag/SiO2/Al triple layers in which the top Al layer is patterned by a periodic nano hole array. The absorption spectrum can be easily controlled by adjusting the structure parameters including the radius of the nano hole and the maximal absorption can reach 99.0% in theory. We completely analyze the SPP and LSP modes supported by the metal-dielectric-metal structure and their contribution to the ultrahigh absorption. On this basis, we find a novel method to enhance the absorption via the simultaneous excitation of SPP at different interfaces theoretically and experimentally. Moreover, for the first time we clarify the EOT caused by the nano hole array can enhance the absorption by experiment, which is not reported in previous works. This kind of absorber can be fabricated by low-cost colloidal sphere lithography and the use of stable Al overcomes the disadvantages brought by the noble metal, which make it a more appropriate candidate for photovoltaics, spectroscopy, photodetectors, sensing, and surface enhanced Raman scattering.