UV-Induced Disulfide Formation and Reduction for Dynamic Photopatterning

Lei Li; Wenqian Feng; Alexander Welle; Pavel A Levkin

doi:10.1002/anie.201607276

UV-Induced Disulfide Formation and Reduction for Dynamic Photopatterning

Angew Chem Int Ed Engl. 2016 Oct 24;55(44):13765-13769. doi: 10.1002/anie.201607276. Epub 2016 Oct 4.

Authors

Lei Li¹, Wenqian Feng^{1

2}, Alexander Welle^{3

4}, Pavel A Levkin⁵

Affiliations

¹ Institute of Toxicology and Genetics (ITG), Karlsruhe Institute of Technology (KIT), 76021, Karlsruhe, Germany.
² Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, 69120, Heidelberg, Germany.
³ Institute of Functional Interfaces (IFG), KIT, Germany.
⁴ Karlsruhe Nano Micro Facility (KNMF), Germany.
⁵ Institute of Toxicology and Genetics (ITG), Karlsruhe Institute of Technology (KIT), 76021, Karlsruhe, Germany. levkin@kit.edu.

PMID: 27699955
DOI: 10.1002/anie.201607276

Abstract

UV-induced disulfide formation (UV-DF) and disulfide reduction (UV-DR) reactions for surface functionalization and dynamic photopatterning are presented. Both photochemical reactions allow for the spatially and temporally controlled, reversible transition between thiol- and disulfide-functionalized surfaces. The dynamic photopatterning strategy was demonstrated by the UV-induced attachment, exchange, and detachment on thiol-modified substrates.

Keywords: disulfide formation; disulfide reduction; dynamic photopatterning; photochemistry; surface modification.

Publication types

Research Support, Non-U.S. Gov't