Engineering Surfaces through Sequential Stop-Flow Photopatterning

Christian W Pester; Benjaporn Narupai; Kaila M Mattson; David P Bothman; Daniel Klinger; Kenneth W Lee; Emre H Discekici; Craig J Hawker

doi:10.1002/adma.201602900

Engineering Surfaces through Sequential Stop-Flow Photopatterning

Adv Mater. 2016 Nov;28(42):9292-9300. doi: 10.1002/adma.201602900. Epub 2016 Sep 12.

Authors

Christian W Pester^{1

2}, Benjaporn Narupai^{1

3}, Kaila M Mattson^{1

3}, David P Bothman⁴, Daniel Klinger⁵, Kenneth W Lee⁶, Emre H Discekici^{1

3}, Craig J Hawker^{1

2

3}

Affiliations

¹ Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
² Materials Department, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
³ Department of Chemistry and Biochemistry, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
⁴ Department of Mechanical and Environmental Engineering, University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
⁵ Institut für Pharmazie, Freie Universität Berlin, 14195, Berlin, Germany.
⁶ Department of Physics, University of California, Santa Barbara, CA, 93106, USA.

PMID: 27615382
DOI: 10.1002/adma.201602900

Abstract

Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.

Keywords: flow chemistry; lithography; patterning; photochemistry; polymer surfaces.