Nanosphere lithography (NSL) has been widely used as an inexpensive method to create periodic arrays of metallic nanoparticles or nanodiscs on substrates. However, most nanodisc arrays derived from a NSL template are restricted to hexagonally-ordered triangular arrays because the metal layer is deposited onto the interstices between the nanospheres. Metallic nanodisc arrays with the same arrangement as the original nanosphere array have been rarely reported. Here, we demonstrate a facile, low-cost method to fabricate large-area hexagonal arrays of metallic nanodiscs using an NSL template combined with a two-step lift-off process. We employ a bi-layer of two dissimilar metals to create a re-entrant sidewall profile to undercut the sacrificial layer and facilitate the final lift-off of the metallic nanodiscs. The quality of the nanodisc pattern and the array periodicity is determined using statistical image analysis and compared to the original nanosphere array in terms of size distribution, surface smoothness, and array pitch. This nanodisc array is used as an etch mask to create a vertically-aligned Si nanowire array. This combined approach is a scalable and inexpensive fabrication method for creating relatively large-area, ordered arrays of various nanostructures.