Flexible Electronics: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells (Adv. Mater. 28/2016)

Rongrui He; Todd D Day; Justin R Sparks; Nichole F Sullivan; John V Badding

doi:10.1002/adma.201670195

Flexible Electronics: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells (Adv. Mater. 28/2016)

Adv Mater. 2016 Jul;28(28):5938. doi: 10.1002/adma.201670195.

Authors

Rongrui He¹, Todd D Day¹, Justin R Sparks¹, Nichole F Sullivan¹, John V Badding^{1

2}

Affiliations

¹ Department of Chemistry and Materials, Research Institute, Pennsylvania State University, University Park, PA, 16802, USA.
² Department of Physics, Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, 16802, USA.

PMID: 27442970
DOI: 10.1002/adma.201670195

Abstract

On page 5939, J. V. Badding and co-workers describe the unrolling of a flexible hydrogenated amorphous silicon solar cell, deposited by high-pressure chemical vapor deposition. The high-pressure deposition process is represented by the molecules of silane infiltrating the small voids between the rolled up substrate, facilitating plasma-free deposition over a very large area. The high-pressure approach is expected to also find application for 3D nanoarchitectures.

Keywords: chemical vapor deposition; flexible electronics; hydrogenated amorphous silicon; solar cells; thin films.