The design and development of a novel apparatus for the simultaneous measurement of electrical resistivity and Seebeck coefficient of films is reported here. Mounting stage is integrated inside a cryostat chamber enabling measurements over the 10-400 K temperature range, intended for organic thermoelectrics. Finite element method was used to analyze the thermo-mechanical response of the sample holder. The apparatus was validated against high purity nickel film, and a very good agreement was found.