Novel High-Throughput Screening Approach for Functional Metal/Oxide Interfaces

J Chem Theory Comput. 2016 Apr 12;12(4):1572-82. doi: 10.1021/acs.jctc.5b01192. Epub 2016 Mar 8.

Abstract

Metal/oxide interfaces have long been studied for their fundamental importance in material microstructure as well as their broad applicability in electronic devices. However, the challenge involved in characterizing the relation between structure and electron transport of a large number of metal/oxide combinations inhibits the search for interfaces with improved functionality. Therefore, we develop a novel high-throughput screening approach that combines computational and theoretical techniques. We use a Density Functional Theory + U (DFT+U) quantum mechanical formalism to produce effective Schrödinger equations, which are solved by wave packet propagation to simulate charge transport across the metal/oxide interface. We demonstrate this method on α-Fe2O3/Mt interfaces, for Mt = Ag, Al, Au, Ir, Pd, or Pt metals. We use this novel method to screen for binary alloys of these metals at the α-Fe2O3/Mt interface and perform a successful validation test of the methodology. Finally, we correlate the interface potential energy and the charge transport permeability through the interface. Counterintuitively, among the interfaces studied, we find that higher mismatch interfaces have better charge transport permeability. We anticipate that this method will be useful as a computationally tractable strategy to perform high-throughput screening for new metal/oxide interfaces.

Publication types

  • Research Support, Non-U.S. Gov't