Mogul-Patterned Elastomeric Substrate for Stretchable Electronics

Han-Byeol Lee; Chan-Wool Bae; Le Thai Duy; Il-Yung Sohn; Do-Il Kim; You-Joon Song; Youn-Jea Kim; Nae-Eung Lee

doi:10.1002/adma.201505218

Mogul-Patterned Elastomeric Substrate for Stretchable Electronics

Adv Mater. 2016 Apr;28(16):3069-77. doi: 10.1002/adma.201505218. Epub 2016 Feb 24.

Authors

Han-Byeol Lee¹, Chan-Wool Bae¹, Le Thai Duy¹, Il-Yung Sohn¹, Do-Il Kim¹, You-Joon Song², Youn-Jea Kim², Nae-Eung Lee³

Affiliations

¹ School of Advanced Materials Science & Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
² School of Mechanical Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.
³ School of Advanced Materials Science & Engineering, SKKU Advanced Institute of Nanotechnology (SAINT) and, Samsung Advanced Institute for Health Sciences & Technology (SAIHST), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Kyunggi-do, 16419, South Korea.

PMID: 26917352
DOI: 10.1002/adma.201505218

Abstract

A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics.

Keywords: double photolithography; mogul-patterned substrate; reduced graphene oxide chemiresistor; soft lithography; stretchable.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Dimethylpolysiloxanes / chemistry
Elasticity*
Elastomers
Electronics / instrumentation*
Electronics / methods*
Gold / chemistry
Graphite / chemistry
Polymers / chemistry*
Printing

Substances

Dimethylpolysiloxanes
Elastomers
Polymers
elastomeric polymer
Gold
Graphite