The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals

Dahuai Zheng; Yongfa Kong; Shiguo Liu; Muling Chen; Shaolin Chen; Ling Zhang; Romano Rupp; Jingjun Xu

doi:10.1038/srep20308

The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals

Sci Rep. 2016 Feb 3:6:20308. doi: 10.1038/srep20308.

Authors

Dahuai Zheng^{1

2}, Yongfa Kong^{3

4

2}, Shiguo Liu¹, Muling Chen^{1

2}, Shaolin Chen³, Ling Zhang³, Romano Rupp^{3

5}, Jingjun Xu^{1

3

2}

Affiliations

¹ School of Physics, Nankai University, Tianjin 300071, China.
² Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
³ MOE Key Laboratory of Weak-Light Nonlinear Photonics and TEDA Applied Physics School, Nankai University, Tianjin 300457, China.
⁴ R&D Center, Taishan Sports Industry Group, Leling 253600, China.
⁵ Vienna University, Faculty of Physics, A-1090 Wien, Austria.

Abstract

For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi2O3 co-doped LiNbO3 (LN:Bi,Mg). The photorefractive response time of LN:Bi,Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi,Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn't equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.

Publication types

Research Support, Non-U.S. Gov't