Liquid-Phase Beam Pen Lithography

Shu He; Zhuang Xie; Daniel J Park; Xing Liao; Keith A Brown; Peng-Cheng Chen; Yu Zhou; George C Schatz; Chad A Mirkin

doi:10.1002/smll.201502666

Liquid-Phase Beam Pen Lithography

Small. 2016 Feb 24;12(8):988-93. doi: 10.1002/smll.201502666. Epub 2016 Jan 7.

Authors

Shu He¹, Zhuang Xie¹, Daniel J Park¹, Xing Liao², Keith A Brown¹, Peng-Cheng Chen², Yu Zhou², George C Schatz¹, Chad A Mirkin^{1

2}

Affiliations

¹ Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
² Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, IL, 60208, USA.

PMID: 26743998
DOI: 10.1002/smll.201502666

Abstract

Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip-substrate gap and aperture size on patterning performance is systematically investigated. As a proof-of-concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium.

Keywords: beam pen lithography; lithography; nucleotide nanoarrays; photochemistry; photolithography; scanning probe lithography.

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.