Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films

Yecheol Rho; Karim Aissou; Muhammad Mumtaz; Wonsang Kwon; Gilles Pécastaings; Cristian Mocuta; Stefan Stanecu; Eric Cloutet; Cyril Brochon; Guillaume Fleury; Georges Hadziioannou

doi:10.1002/smll.201500439

Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films

Small. 2015 Dec 22;11(48):6377-83. doi: 10.1002/smll.201500439. Epub 2015 Nov 5.

Authors

Affiliations

¹ Laboratoire de Chimie des Polymères Organiques, CNRS-ENSCPB-Université de Bordeaux, 16 Avenue Pey-Berland, F-33607, Pessac CEDEX, France.
² ARKEMA, Groupement de Recherches de Lacq, RN 117, BP 34, F-64170, Lacq CEDEX, France.
³ Synchrotron SOLEIL, L'Orme des Merisiers Saint Aubin BP 48, 91192, Gif-sur-Yvette CEDEX, France.

PMID: 26540591
DOI: 10.1002/smll.201500439

Abstract

Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders.

Keywords: block copolymers; directed self-assembly; lateral order; moiré patterns; sinusoidal templates.

Publication types

Research Support, Non-U.S. Gov't