X-ray-induced Cu deposition and patterning on insulators at room temperature

Pei-Cheng Hsu; Yu-Sheng Chen; Yeukuang Hwu; J H Je; G Margaritondo; Eng Soon Tok

doi:10.1107/S1600577515015234

X-ray-induced Cu deposition and patterning on insulators at room temperature

J Synchrotron Radiat. 2015 Nov;22(6):1524-7. doi: 10.1107/S1600577515015234. Epub 2015 Sep 26.

Authors

Pei-Cheng Hsu¹, Yu-Sheng Chen¹, Yeukuang Hwu¹, J H Je², G Margaritondo³, Eng Soon Tok⁴

Affiliations

¹ Institute of Physics, Academia Sinica, Nankang, Taipei 115, Taiwan.
² X-ray Imaging Center, Pohang University of Science and Technology, Pohang, Taiwan.
³ Faculté des Sciences de Base, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
⁴ Physics Department, National University of Singapore, Singapore.

PMID: 26524317
DOI: 10.1107/S1600577515015234

Abstract

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and the products can be used as seeds for electroplating of thicker overlayers.

Keywords: X-ray synthesis; copper seed layer; electroless plating; micro-patterning.

Publication types

Research Support, Non-U.S. Gov't