Optimal azimuthal orientation for Si(111) double-crystal monochromators to achieve the least amount of glitches in the hard X-ray region

Zheng Tang; Lirong Zheng; Shengqi Chu; Min Wu; Pengfei An; Long Zhang; Tiandou Hu

doi:10.1107/S1600577515012345

Optimal azimuthal orientation for Si(111) double-crystal monochromators to achieve the least amount of glitches in the hard X-ray region

J Synchrotron Radiat. 2015 Sep;22(5):1147-50. doi: 10.1107/S1600577515012345. Epub 2015 Jul 15.

Authors

Zheng Tang¹, Lirong Zheng¹, Shengqi Chu¹, Min Wu¹, Pengfei An¹, Long Zhang¹, Tiandou Hu¹

Affiliation

¹ Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of China.

PMID: 26289264
DOI: 10.1107/S1600577515012345

Abstract

Simulations of the periods, split regularities and mirror symmetries of the glitch pattern of a Si(111) crystal along with the azimuthal angles are presented. The glitch patterns of Si(111) double-crystal monochromators (DCMs) are found to be the superposition of the two sets of glitch patterns from the two crystals. The optimal azimuthal orientation ϕ1,2 = [(2n+1)π]/6 (n = 0, ±1, ±2…) for Si(111) DCMs to achieve the least amount of glitches in the hard X-ray region has been suggested.

Keywords: XAFS; double-crystal monochromator; glitches; multiple-beam diffraction; optimal azimuthal orientation.

Publication types

Research Support, Non-U.S. Gov't