Oxygen-Inhibition Lithography for the Fabrication of Multipolymeric Structures

Adv Mater. 2015 Aug 19;27(31):4560-5. doi: 10.1002/adma.201501737. Epub 2015 Jul 14.

Abstract

The oxygen inhibition of UV curable polymers is exploited in novel technology for the fabrication of patterns and closed devices. Multiscale structures with thicknesses ranging from few micro-meters to millimeters are rapidly fabricated. Multipolymeric and multifunctional structures are also prepared: adequately choosing the material of each layer, a set of different properties is arranged in the same device.

Keywords: UV curing; multifunctional devices; multimaterial structures; oxygen inhibition; polymeric devices.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Hydrophobic and Hydrophilic Interactions
  • Lab-On-A-Chip Devices
  • Microscopy, Electron, Scanning
  • Microtechnology / methods*
  • Optical Imaging
  • Oxygen / chemistry*
  • Photochemical Processes
  • Polymers / chemistry*
  • Polymers / radiation effects*
  • Surface Properties
  • Ultraviolet Rays*
  • Water / chemistry

Substances

  • Polymers
  • Water
  • Oxygen