Aqueous Solution-Deposited Gallium Oxide Dielectric for Low-Temperature, Low-Operating-Voltage Indium Oxide Thin-Film Transistors: A Facile Route to Green Oxide Electronics

Wangying Xu; Hongtao Cao; Lingyan Liang; Jian-Bin Xu

doi:10.1021/acsami.5b02451

Aqueous Solution-Deposited Gallium Oxide Dielectric for Low-Temperature, Low-Operating-Voltage Indium Oxide Thin-Film Transistors: A Facile Route to Green Oxide Electronics

ACS Appl Mater Interfaces. 2015 Jul 15;7(27):14720-5. doi: 10.1021/acsami.5b02451. Epub 2015 Jun 30.

Authors

Wangying Xu¹, Hongtao Cao, Lingyan Liang, Jian-Bin Xu¹

Affiliation

¹ †Department of Electronic Engineering, Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, China.

PMID: 26054237
DOI: 10.1021/acsami.5b02451

Abstract

We reported a novel aqueous route to fabricate Ga2O3 dielectric at low temperature. The formation and properties of Ga2O3 were investigated by a wide range of characterization techniques, revealing that Ga2O3 films could effectively block leakage current even after annealing in air at 200 °C. Furthermore, all aqueous solution-processed In2O3/Ga2O3 TFTs fabricated at 200 and 250 °C showed mobilities of 1.0 and 4.1 cm2 V(-1) s(-1), on/off current ratio of ∼10(5), low operating voltages of 4 V, and negligible hysteresis. Our study represents a significant step toward the development of low-cost, low-temperature, and large-area green oxide electronics.

Keywords: aqueous route; gallium oxide dielectric; green oxide electronics; indium oxide; low-temperature; oxide thin-film transistors.

Publication types

Research Support, Non-U.S. Gov't