Acid-stable peroxoniobophosphate clusters to make patterned films

Jung-Ho Son; Deok-Hie Park; Douglas A Keszler; William H Casey

doi:10.1002/chem.201500684

Acid-stable peroxoniobophosphate clusters to make patterned films

Chemistry. 2015 Apr 27;21(18):6727-31. doi: 10.1002/chem.201500684. Epub 2015 Mar 13.

Authors

Jung-Ho Son¹, Deok-Hie Park, Douglas A Keszler, William H Casey

Affiliation

¹ Department of Chemistry, University of California, Davis, One Shields Ave, Davis, CA 95616 (USA), Fax: (+1) 530-752-8995. junghoson@gmail.com.

PMID: 25772349
DOI: 10.1002/chem.201500684

Abstract

Two new peroxoniobophosphate clusters were isolated as tetramethylammonium (TMA) salts having the stoichiometries: TMA5[HNb4P2O14(O2)4]⋅9 H2O and TMA3[H7Nb6P4O24(O2)6]⋅7 H2O. The former is stable over the pH range: 3<pH<12 and the latter is stable only below pH 3. These two molecules interconvert as a function of solution pH. The [H7Nb6P4O24(O2)6](3-) cluster can be used to fabricate patterned niobium phosphate films by electron-beam lithography after solution deposition.

Keywords: niobium; peroxides; phosphorus; polyoxometalates; synthesis.