A general design strategy for block copolymer directed self-assembly patterning of integrated circuits contact holes using an alphabet approach

He Yi; Xin-Yu Bao; Richard Tiberio; H-S Philip Wong

doi:10.1021/nl502172m

A general design strategy for block copolymer directed self-assembly patterning of integrated circuits contact holes using an alphabet approach

Nano Lett. 2015 Feb 11;15(2):805-12. doi: 10.1021/nl502172m. Epub 2015 Jan 8.

Authors

He Yi¹, Xin-Yu Bao, Richard Tiberio, H-S Philip Wong

Affiliation

¹ Department of Electrical Engineering, Stanford University , Stanford, California 94305, United States.

PMID: 25551471
DOI: 10.1021/nl502172m

Abstract

Directed self-assembly (DSA) is a promising lithography candidate for technology nodes beyond 14 nm. Researchers have shown contact hole patterning for random logic circuits using DSA with small physical templates. This paper introduces an alphabet approach that uses a minimal set of small physical templates to pattern all contacts configurations on integrated circuits. We illustrate, through experiments, a general and scalable template design strategy that links the DSA material properties to the technology node requirements.

Keywords: Block copolymer; alphabet approach; contact hole patterning; design strategy; directed self-assembly.

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.