Role of the resistivity of insulating field emitters on the energy of field-ionised and field-evaporated atoms

Ultramicroscopy. 2015 Dec:159 Pt 2:139-46. doi: 10.1016/j.ultramic.2014.11.018. Epub 2014 Nov 28.

Abstract

In order to improve the accuracy of laser atom probe analyses, it is important to understand all the physical processes induced by the combination of the high electrical field and the femtosecond laser beam during field evaporation. New information can be accessed from the energy of evaporated surface atoms or field-ionised atoms of an imaging gas. In order to study the ions energy, we combine La-APT and FIM analyses in a new experimental setup equipped with electrostatic lenses. We report measurements for semiconductors and oxides and we study the influence of the illumination conditions (laser power and wavelength), the evaporation rate, the sample geometry and the tip preparation processes. The results are discussed taking into account the resistive properties of non-metallic samples and the photo-stimulated conductivity. This work clarifies the role of the laser and DC field in the energy deficit of field evaporated ions.

Keywords: Atom probe tomography; Field emitter; Field ion microscopy; Insulators; Resistivity; Semiconductors.

Publication types

  • Research Support, Non-U.S. Gov't