Note: development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

Thanh Hung Dinh; Yuhei Suzuki; Ryoichi Hirose; Hiroyuki Hara; Hayato Ohashi; Bowen Li; Padraig Dunne; Gerry O'Sullivan; Atsushi Sunahara; Takeshi Higashiguchi

doi:10.1063/1.4901934

Note: development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

Rev Sci Instrum. 2014 Nov;85(11):116104. doi: 10.1063/1.4901934.

Authors

Affiliations

¹ Department of Advanced Interdisciplinary Sciences and Center for Optical Research (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585, Japan.
² Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan.
³ Graduate School of Science and Engineering for Research, University of Toyama, Toyama, Toyama 930-8555, Japan.
⁴ School of Physics, University College Dublin, Belfield, Dublin 4, Ireland.
⁵ Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871, Japan.

PMID: 25430153
DOI: 10.1063/1.4901934

Abstract

We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 μm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.