Platinum-carbon deposits made via electron-beam-induced deposition were purified via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ∼485 K, and the purification rate is a function of the PtC5 thickness (80-360 nm) and laser pulse width (1-100 μs) in the ranges studied. The thickness dependence is attributed to the ∼235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.
Keywords: annealing; focused electron-beam-induced deposition; nanofabrication; platinum; pulsed laser; purification.