Released micromachined beams utilizing laterally uniform porosity porous silicon

Xiao Sun; Adrian Keating; Giacinta Parish

doi:10.1186/1556-276X-9-426

Released micromachined beams utilizing laterally uniform porosity porous silicon

Nanoscale Res Lett. 2014 Aug 22;9(1):426. doi: 10.1186/1556-276X-9-426. eCollection 2014.

Authors

Xiao Sun¹, Adrian Keating², Giacinta Parish³

Affiliations

¹ School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia ; School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
² School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
³ School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.

Abstract

Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.

Pacs: 81.16.-c; 81.16.Nd; 81.16.Rf.

Keywords: Microbeams; Photolithography; Porous silicon; Release.