Ion-beam-sputtering (IBS) single-layer and multilayer coating designs for UV applications were examined after the deposition process as well as after a defined postdeposition treatment. High internal compressive film stress as well as moderate absorption losses in the UV spectral range were measured at the as-deposited thin films. Due to a controlled postdeposition treatment process, the absorption losses and the high compressive stress can be reduced significantly. We show that the remaining thin-film stress of SiO2 and HfO2 multilayer designs can be specifically manipulated by the parameters of the postdeposition treatment. Even zero and tensile stress can be achieved for complex multilayer coatings.