Plasmonic films based on colloidal lithography

Bin Ai; Ye Yu; Helmuth Möhwald; Gang Zhang; Bai Yang

doi:10.1016/j.cis.2013.11.010

Plasmonic films based on colloidal lithography

Adv Colloid Interface Sci. 2014 Apr:206:5-16. doi: 10.1016/j.cis.2013.11.010. Epub 2013 Nov 23.

Authors

Bin Ai¹, Ye Yu¹, Helmuth Möhwald², Gang Zhang³, Bai Yang¹

Affiliations

¹ State Key Lab of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China.
² Max Planck Institute of Colloids and Interfaces, D-14424 Potsdam, Germany.
³ State Key Lab of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China. Electronic address: gang@jlu.edu.cn.

PMID: 24321859
DOI: 10.1016/j.cis.2013.11.010

Abstract

This paper reviews recent advances in the field of plasmonic films fabricated by colloidal lithography. Compared with conventional lithography techniques such as electron beam lithography and focused ion beam lithography, the unconventional colloidal lithography technique with advantages of low-cost and high-throughput has made the fabrication process more efficient, and moreover brought out novel films that show remarkable surface plasmon features. These plasmonic films include those with nanohole arrays, nanovoid arrays and nanoshell arrays with precisely controlled shapes, sizes, and spacing. Based on these novel nanostructures, optical and sensing performances can be greatly enhanced. The introduction of colloidal lithography provides not only efficient fabrication processes but also plasmonic films with unique nanostructures, which are difficult to be fabricated by conventional lithography techniques.

Keywords: Colloidal lithography; Plasmonic films; Surface plasmon resonance.