Challenging material patterning: fine lithography on coarse substrates

Scanning. 2014 May-Jun;36(3):362-7. doi: 10.1002/sca.21126. Epub 2013 Oct 29.

Abstract

Precise patterning of inorganic materials is important for many technological applications. Often lithography processes are required on challenging substrates with respect to topography, flexibility, and surface adhesion. Here we show the fabrication of artificial gunshot residues (GSR) on adhesive tape samples by means of dip-pen lithography as an example for fine lithography on coarse substrates. We deposited lead-, barium-, and antimony-containing inks on SEM adhesive tape by direct writing with a fine tip. Single as well as multiple element structures with dimensions in the range of 10-75 µm were fabricated.

Keywords: SEM/EDX; dip-pen nanolithography; forensic science; gunshot residues.

Publication types

  • Research Support, Non-U.S. Gov't