A novel extreme ultraviolet four channels normal incidence imaging system for plasma diagnostics of Z-pinch facility

Xin Wang; Baozhong Mu; Jingtao Zhu; Ling Wang; Shengzhen Yi; Wenbin Li; Zhanshan Wang; Yi Qin; Zeping Xu; Rongkun Xu; Zhenghong Li

doi:10.1063/1.4812444

A novel extreme ultraviolet four channels normal incidence imaging system for plasma diagnostics of Z-pinch facility

Rev Sci Instrum. 2013 Jul;84(7):073705. doi: 10.1063/1.4812444.

Authors

Xin Wang¹, Baozhong Mu, Jingtao Zhu, Ling Wang, Shengzhen Yi, Wenbin Li, Zhanshan Wang, Yi Qin, Zeping Xu, Rongkun Xu, Zhenghong Li

Affiliation

¹ MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China.

PMID: 23902074
DOI: 10.1063/1.4812444

Abstract

A novel EUV four channels normal incidence imaging system for plasma diagnostics of Z-pinch facility was presented in this paper, which consists of four concave mirrors and one convex mirror used for focusing an object onto four different positions with about 30 μm resolution on the same image plane. In addition, this imaging system can work at the energies of 50 eV, 95 eV, 150 eV, and broadband of 50-100 eV by using different multilayer films deposited on the concave and convex mirrors. This instrument, combined with framing camera, can achieve the power of two-dimensional spatial and temporal resolution, as well as the ability to imaging the plasma at the specific temperature. In the paper, the four channels microscope centering at multi-energies was developed.