Using a modified chemical vapor deposition (CVD) method, we have prepared a class of new graphene foams (GFs) doped with nitrogen, boron or both. Nitrogen-doped graphene foams (N-GFs) with a nitrogen doping level of 3.1 atom% were prepared by CVD of CH4 in the presence of NH3 while boron-doped graphene foams (B-GFs) with a boron doping level of 2.1 atom% were produced by using toluene and triethyl borate as a carbon and a boron source. On the other hand, graphene foams co-doped with nitrogen (4.5 atom%) and boron (3 atom%) (BN-GFs) were prepared by CVD using melamine diborate as the precursor. In all cases, scanning electron microscope (SEM) images revealed well-defined foam-like microstructures, while electrochemical measurements showed much higher electrocatalytic activities toward oxygen reduction reaction for the doped graphene foams than their undoped counterparts.