Demonstration of Silicon-on-insulator mid-infrared spectrometers operating at 3.8 μm

Opt Express. 2013 May 20;21(10):11659-69. doi: 10.1364/OE.21.011659.

Abstract

The design and characterization of silicon-on-insulator mid-infrared spectrometers operating at 3.8 μm is reported. The devices are fabricated on 200 mm SOI wafers in a CMOS pilot line. Both arrayed waveguide grating structures and planar concave grating structures were designed and tested. Low insertion loss (1.5-2.5 dB) and good crosstalk characteristics (15-20 dB) are demonstrated, together with waveguide propagation losses in the range of 3 to 6 dB/cm.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Electric Conductivity
  • Equipment Design
  • Equipment Failure Analysis
  • Refractometry / instrumentation*
  • Silicon / chemistry*
  • Spectrophotometry, Infrared / instrumentation*
  • Surface Plasmon Resonance / instrumentation*

Substances

  • Silicon